Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...
At first, the notion might seem strange. You should be designing and they should be buying. That’s the way business works, right? Sure, that’s the way business usually works … but who says you have to ...
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